The Market Reports

Synopsis

The global market for Mask Blanks was estimated to be worth US$ 3161 million in 2024 and is forecast to a readjusted size of US$ 4778 million by 2031 with a CAGR of 6.1% during the forecast period 2025-2031.

This report provides a comprehensive assessment of recent tariff adjustments and international strategic countermeasures on Mask Blanks cross-border industrial footprints, capital allocation patterns, regional economic interdependencies, and supply chain reconfigurations.

Mask Blanks are the products which are formed from a chrome or molybdenum silicide based thin film on mainly quartz or soda-lime glass substrate. And they are coated by photosensitive resist materials which sensitive for electron or laser beam and resist for etching process to make circuit patterns.

Global key players of Mask Blanks include Shin-Etsu MicroSi, Inc., HOYA, AGC, S&S Tech and ULCOAT. The top five players hold a share over 90%. In terms of product, low reflectance chrome-film mask blanks are the largest segment, with a share about 66%. And in terms of application, the largest application is Semiconductor, with a share about 55%.

The main market drivers include the following:

1. Growing demand in the semiconductor industry

Expanding downstream applications
5G and AI-driven: Surges in demand for high-performance semiconductors in areas such as 5G base stations, AI chips, and automotive electronics are driving production growth for chips with process technology of 28nm and above.

Advanced process upgrades: Processes below 28nm (such as 7nm and 5nm) require mask substrates with precision down to the nanometer level, with synthetic quartz substrates becoming the preferred choice due to their high transmittance and low thermal expansion coefficient.

Accelerated domestic substitution: Domestic companies (such as Philihua and Luwei Optoelectronics) have broken through technological barriers, increasing the domestic production rate from less than 10% in 2018 to 30% in 2025, and projected to exceed 50% in 2027.

Independent third-party mask manufacturers are expanding their market share, and wafer fabs are increasing the proportion of outsourced manufacturing for mature processes (above 28nm) to 47.3%. 2. Display Panel Industry Upgrade

2.Large-Screen Trend

High-Generation Line Construction: The increase in panel production lines for Generation 8.6 and above (such as Generation 10.5) is driving demand for large photomask blanks, with substrate sizes expanding from 1m×1m in Generation 5 to 3m×3m in Generation 11.

Technological Iteration: New display technologies such as AMOLED/LTPO/LTPS require submicron precision for mask substrates, driving demand for high-end substrates.

3. Technological Advancement and Material Innovation

Advantages of Synthetic Quartz Substrates

Excellent Performance: High purity (impurity content <10ppb), low thermal expansion coefficient (<0.1ppm/°C), and transmittance (>90% at 200nm wavelength), making them suitable for DUV/EUV lithography.
Process Breakthrough: Domestic companies have reduced defect density from 15 defects per square inch to 5 defects per square inch, meeting the entry standard for Generation 5 lines. Coating Process Improvements
Molybdenum-silicon binary light shielding layer (OMOG): Shin-Etsu Chemical has developed an alternative to the traditional chromium layer, improving stability and etching performance, driving demand for high-end substrates.
EUV Technology Adaptation: Reflective mask substrates (such as those patented by Ken Kinoshita) are adapted for extreme ultraviolet lithography, becoming a key material for processes below 7nm.

4. Policy Support and Industry Chain Collaboration

National Policy Promotion
Localization Target: "Made in China 2025" and other policies clearly define increasing the localization rate of semiconductor materials, with a target of 50% by 2025.

Financial Support: Jiaxing Lien Semiconductor invested 3 billion yuan in the project, establishing a complete supply chain for photomask materials.

Industry Chain Integration

Vertical Integration: Luwei Optoelectronics has established full-generation mask production capacity from G2.5 to G11, and Philihua has achieved vertical integration from quartz sand to substrates.

Equipment Localization: Xinji Micro-Equipment has delivered 90nm node direct-write lithography equipment, reducing dependence on imported equipment.

5. Changing Market Competition Landscape

Breaking International Monopoly
Dominated by Japanese and Korean Companies: Shin-Etsu Chemical and Tosoh Quartz Crystal hold a 50% share of the high-end market, but domestic companies are gradually penetrating through technical certifications (e.g., Philihua's Tokyo Electron certification).

6. Cost and Supply Chain Factors

Raw Material Cost Optimization
Scale-up of Synthetic Quartz: Philihua's G8.5-generation substrate mass production has reduced unit costs, driving down prices for high-end substrates.

Equipment Localization: Domestic photolithography equipment (e.g., Core Micro's 90nm equipment) offers significant price advantages, improving mask blank production efficiency.

The core drivers of the Mask Blanks market include: escalating demand from the semiconductor and display panel industries, technological breakthroughs in high-end materials like synthetic quartz, localization policies and industry chain integration, and technological adaptation to emerging applications such as 5G/AI. In the future, with the widespread adoption of EUV technology and the improvement of domestic companies' technological capabilities, the market will exhibit a parallel trend of high-end production, localization, and scale.

This report aims to provide a comprehensive presentation of the global market for Mask Blanks, focusing on the total sales volume, sales revenue, price, key companies market share and ranking, together with an analysis of Mask Blanks by region & country, by Type, and by Application.

The Mask Blanks market size, estimations, and forecasts are provided in terms of sales volume (K Sqm) and sales revenue ($ millions), considering 2024 as the base year, with history and forecast data for the period from 2020 to 2031. With both quantitative and qualitative analysis, to help readers develop business/growth strategies, assess the market competitive situation, analyze their position in the current marketplace, and make informed business decisions regarding Mask Blanks.

Market Segmentation

By Company

• Shin-Etsu MicroSi, Inc.
• HOYA
• AGC
• S&S Tech
• ULCOAT
• Telic
• SKC
• CST Co., Ltd.

Segment by Type

• Low Reflectance Chrome-film Mask Blanks
• Attenuated Phase Shift Mask Blanks

Segment by Application

• Semiconductor
• Flat Panel Display
• Touch Industry
• Circuit Board

Segment by Region

• North America: United States, Canada, and Mexico
• Europe: United Kingdom, Germany, France, Spain, Italy, and Rest of Europe
• Asia Pacific: China, India, Japan, Australia, South Korea, and Rest of Asia Pacific
• Middle East & Africa: Saudi Arabia, South Africa, and Rest of MEA
• Latin America: Brazil, Argentina, and Rest of Latin America

*If you need a regional or country-specific version, or customized segmentation, we can tailor the report to your requirements.