The Market Reports

Synopsis

The global market for Semiconductor Cleaning and Etching Gas was estimated to be worth US$ 1821 million in 2024 and is forecast to a readjusted size of US$ 4363 million by 2031 with a CAGR of 7.6% during the forecast period 2025-2031.

Semiconductor Cleaning Gas are gases utilized to remove various contaminants from the surface of semiconductor wafers. Contaminants can include organic substances, metal ions, particles, and residual substances from previous process steps. Cleaning gases work through physical or chemical actions to ensure the wafer surface is clean and suitable for subsequent manufacturing processes.

Common Types
Hydrogen Chloride (HCl): It is often used to remove metal impurities on the wafer surface. HCl can react with metal oxides to form soluble metal chlorides, which can then be easily washed away.

Ammonia (NH₃): Ammonia is commonly employed for cleaning organic contaminants. It can dissolve and remove organic substances through chemical reactions and hydrogen bonding interactions.

Oxygen (O₂): Oxygen is frequently used in plasma cleaning processes. In a plasma environment, oxygen can react with organic contaminants to form carbon dioxide and water, which are volatile and can be removed from the wafer surface.

Etching gases are gases that are used to selectively remove or etch specific materials from the semiconductor wafer surface to create precise patterns and structures. This is a crucial process in defining the various components and circuits on the semiconductor device.

Common Types
Chlorine-based Gases: Such as chlorine (Cl₂) and boron trichloride (BCl₃). They are often used for etching metals and silicon. For example, Cl₂ can react with silicon to form silicon tetrachloride (SiCl₄), which is a volatile compound and can be removed from the wafer surface, thereby achieving the etching of silicon.

Fluorine-based Gases: Such as fluorine (F₂), sulfur hexafluoride (SF₆), and nitrogen trifluoride (NF₃). Fluorine-based gases are widely used for etching silicon dioxide and silicon nitride. SF₆, for instance, can react with silicon dioxide in a plasma environment to form silicon tetrafluoride (SiF₄) and other volatile fluorides, enabling the precise removal of silicon dioxide layers.

Hydrogen Bromide (HBr): HBr is used for etching certain metal layers and silicon in some semiconductor processes. It can react with the target material to form volatile bromides, which are then removed from the surface.

The Semiconductor Industry Association (SIA) announced global semiconductor sales hit $627.6 billion in 2024, an increase of 19.1% compared to the 2023 total of $526.8 billion. Additionally, fourth-quarter sales of $170.9 billion were 17.1% more than the fourth quarter of 2023, and 3.0% higher than the third quarter of 2024. And global sales for the month of December 2024 were $57.0 billion, a decrease of 1.2% compared to the November 2024 total.

“The global semiconductor market experienced its highest-ever sales year in 2024, topping $600 billion in annual sales for the first time, and double-digit market growth is projected for 2025,” said John Neuffer, SIA president and CEO. “Semiconductors enable virtually all modern technologies – including medical devices, communications, defense applications, AI, advanced transportation, and countless others – and the long-term industry outlook is incredibly strong.”

Semiconductor cleaning and etching gases are special gases used in the semiconductor manufacturing process to clean semiconductor wafers and etch specific materials on them.In terms of semiconductor cleaning and etching gas production, Japan and South Korea are currently the world's largest high-end semiconductor cleaning and etching gas production regions, and export to many countries around the world. At the same time, with the development of industry, customers have put forward more quality requirements and higher technical indicators for Semiconductor Cleaning and Etching Gass as their key raw materials. Semiconductor Cleaning and Etching Gas companies should actively improve product quality to make their products attractive in the market.

The main semiconductor cleaning and etching gas manufacturers in the market include SK Materials, Kanto Denka Kogyo, Resonac, Linde Group, Peric, Hyosung, etc. Japanese and Korean companies have a large share in the high-end market, among which the top five companies in 2023 accounted for 49.44% of the revenue market share. With the rapid rise of China's semiconductor industry and the government's strong support for the semiconductor industry, Chinese companies will continue to increase their R&D investment, enhance their independent R&D capabilities, and develop a series of high-purity, high-performance cleaning and etching gases.

This report aims to provide a comprehensive presentation of the global market for Semiconductor Cleaning and Etching Gas, focusing on the total sales volume, sales revenue, price, key companies market share and ranking, together with an analysis of Semiconductor Cleaning and Etching Gas by region & country, by Type, and by Application.

The Semiconductor Cleaning and Etching Gas market size, estimations, and forecasts are provided in terms of sales volume (Tons) and sales revenue ($ millions), considering 2024 as the base year, with history and forecast data for the period from 2020 to 2031. With both quantitative and qualitative analysis, to help readers develop business/growth strategies, assess the market competitive situation, analyze their position in the current marketplace, and make informed business decisions regarding Semiconductor Cleaning and Etching Gas.

Market Segmentation

By Company

• SK Materials
• Kanto Denka Kogyo
• Resonac
• Linde Group
• Peric
• Hyosung
• Taiyo Nippon Sanso
• Merck KGaA
• Mitsui Chemical
• Central Glass
• Haohua Chemical Science & Technology
• Shandong FeiYuan
• Messer Group
• Air Liquide
• Huate Gas

Segment by Type

• Fluoride Gas
• Chloride Gas
• Others

Segment by Application

• Semiconductor Cleaning
• Semiconductor Etching

Segment by Region

• North America: United States, Canada, and Mexico
• Europe: United Kingdom, Germany, France, Spain, Italy, and Rest of Europe
• Asia Pacific: China, India, Japan, Australia, South Korea, and Rest of Asia Pacific
• Middle East & Africa: Saudi Arabia, South Africa, and Rest of MEA
• Latin America: Brazil, Argentina, and Rest of Latin America

*If you need a regional or country-specific version, or customized segmentation, we can tailor the report to your requirements.