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Synopsis
The global market for Semiconductor CMP Filters was estimated to be worth US$ 130 million in 2024 and is forecast to a readjusted size of US$ 206 million by 2031 with a CAGR of 6.5% during the forecast period 2025-2031.
This report provides a comprehensive assessment of recent tariff adjustments and international strategic countermeasures on Semiconductor CMP Filters cross-border industrial footprints, capital allocation patterns, regional economic interdependencies, and supply chain reconfigurations.
CMP refers to the lapping process used in semiconductor wafer production. It uses lapping tools and a lapping and polishing slurry to smooth the wafer. The slurry contains particles ranging from 30 to 200 μm, and standards require that the particle size be controlled to less than 0.5 μm. Failure to filter out particles larger than 0.5 μm can lead to scratches on the wafer surface, making slurry filtration a critical aspect of the process.
In advanced chip manufacturing, the CMP (chemical mechanical polishing) process places extremely high demands on wafer surface quality and flatness. The particle control capabilities of CMP slurry are a key factor in determining yield. Since slurry easily forms gels and agglomerates during preparation and circulation, resulting in large particles, if not effectively filtered, they can easily cause micro-scratches, defects, or even entire wafers to be scrapped, severely impacting production capacity and costs.
Unlike traditional fluid filtration, CMP filters must not only accurately intercept large particles at the tail end but also ensure the passage rate of effective abrasive particles to maintain high polishing rates and stable planarization results. This places significant challenges on the filter's precision, structure, material chemical resistance, and stability.
Thus, CMP filters are deployed throughout the entire process, from slurry production, wafer fabrication, process loops, and end-of-line (POU) systems, to precisely control LPC (large particle count), ensuring high yield and consistency in chip manufacturing from the source.
Currently, companies such as Entegris, Pall, 3M, Cobetter, Hangzhou Deefine, Hangzhou Darlly, and Feature-Tec are continuously promoting the development of CMP filtration solutions through technological innovation to meet the higher demand for filtration performance in advanced processes such as 3D NAND and GAA, becoming a key support force for improving semiconductor yield.
This report aims to provide a comprehensive presentation of the global market for Semiconductor CMP Filters, focusing on the total sales volume, sales revenue, price, key companies market share and ranking, together with an analysis of Semiconductor CMP Filters by region & country, by Technology, and by Application.
The Semiconductor CMP Filters market size, estimations, and forecasts are provided in terms of sales volume (K Units) and sales revenue ($ millions), considering 2024 as the base year, with history and forecast data for the period from 2020 to 2031. With both quantitative and qualitative analysis, to help readers develop business/growth strategies, assess the market competitive situation, analyze their position in the current marketplace, and make informed business decisions regarding Semiconductor CMP Filters.
Market Segmentation
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Published By : QY Research