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Global Chemical Gas Efficient Etching System Market Research Report 2025
Synopsis
Chemical gas efficient etching system is a device used in microelectronics manufacturing, mainly for the production, processing, and etching of fine structures. It is one of the key process equipment in the field of integrated circuit manufacturing and nanomachining. The chemical gas efficient etching system uses chemical gas, plasma, and reaction control technology to etch and process the surface of materials. Its main principle is to generate high-energy particles in gas discharge plasma, and through the action of these particles, chemical reactions and physical etching are carried out on the material surface to form the required microstructure. The system usually consists of the following components: a reaction chamber: a sealed container containing an etching area, used to place material samples to be etched. The environmental control in the reaction chamber can ensure the stability and consistency of the etching process. Gas supply system: used to provide chemical gas mixtures required for etching, such as fluoride, chloride, etc. The gas supply system also includes gas purification and filtration devices to ensure the supply of high-purity gas. Plasma source: A device that generates plasma, usually using an RF or microwave power source. The plasma source generates high-energy particles for etching the material surface by ionizing the gas. Control system: Used to monitor and control parameters of the etching process, such as gas flow rate, pressure, power, etc. The control system can adjust parameters according to specific etching requirements to achieve the desired etching effect. Chemical gas efficient etching systems play an important role in microelectronic manufacturing, which can be used to manufacture semiconductor devices, integrated circuits, optical devices, sensors, and micro/nanostructures. Its high-precision and high-efficiency etching ability makes the preparation of fine structures more precise and controllable, meeting the demand for microelectronic devices in today's high-tech field.
Global Chemical Gas Efficient Etching System market is projected to reach US$ million in 2029, increasing from US$ million in 2022, with the CAGR of % during the period of 2023 to 2029. Influencing issues, such as economy environments, COVID-19 and Russia-Ukraine War, have led to great market fluctuations in the past few years and are considered comprehensively in the whole Chemical Gas Efficient Etching System market research.
Key manufacturers engaged in the Chemical Gas Efficient Etching System industry include Applied Materials, Inc., Lam Research Corporation, Tokyo Electron Limited, ASML Holding N.V., KLA Corporation, Hitachi High-Technologies Corporation, SCREEN Holdings Co., Ltd., Nikon Corporation and ASM International N.V., etc. Among those manufacturers, the top 3 players guaranteed % supply worldwide in 2022.
For production bases, global Chemical Gas Efficient Etching System production is dominated by and . The two regions contributed to % production share globally in 2022.
When refers to consumption region, % volume of Chemical Gas Efficient Etching System were sold to North America, Europe and Asia Pacific in 2022. Moreover, China, plays a key role in the whole Chemical Gas Efficient Etching System market and estimated to attract more attentions from industry insiders and investors.
Report Scope
This report, based on historical analysis (2018-2022) and forecast calculation (2023-2029), aims to help readers to get a comprehensive understanding of global Chemical Gas Efficient Etching System market with multiple angles, which provides sufficient supports to readers’ strategy and decision making.
By Company
Applied Materials, Inc.
Lam Research Corporation
Tokyo Electron Limited
ASML Holding N.V.
KLA Corporation
Hitachi High-Technologies Corporation
SCREEN Holdings Co., Ltd.
Nikon Corporation
ASM International N.V.
Veeco Instruments Inc.
SPTS Technologies Ltd.
Mattson Technology, Inc.
TEL NEXX, Inc.
Axcelis Technologies, Inc.
Segment by Type
Dry Etching System
Wet Etching System
Segment by Application
Semiconductor Industry
Optoelectronics Industry
Mems Industry
Others
Production by Region
North America
Europe
China
Japan
Consumption by Region
North America
United States
Canada
Europe
Germany
France
U.K.
Italy
Russia
Asia-Pacific
China
Japan
South Korea
China Taiwan
Southeast Asia
India
Latin America, Middle East & Africa
Mexico
Brazil
Turkey
GCC Countries
The Chemical Gas Efficient Etching System report covers below items:
Chapter 1: Product Basic Information (Definition, type and application)
Chapter 2: Manufacturers’ Competition Patterns
Chapter 3: Production Region Distribution and Analysis
Chapter 4: Country Level Sales Analysis
Chapter 5: Product Type Analysis
Chapter 6: Product Application Analysis
Chapter 7: Manufacturers’ Outline
Chapter 8: Industry Chain, Market Channel and Customer Analysis
Chapter 9: Market Opportunities and Challenges
Chapter 10: Market Conclusions
Chapter 11: Research Methodology and Data Source
Chemical gas efficient etching system is a device used in microelectronics manufacturing, mainly for the production, processing, and etching of fine structures. It is one of the key process equipment in the field of integrated circuit manufacturing and nanomachining. The chemical gas efficient etching system uses chemical gas, plasma, and reaction control technology to etch and process the surface of materials. Its main principle is to generate high-energy particles in gas discharge plasma, and through the action of these particles, chemical reactions and physical etching are carried out on the material surface to form the required microstructure. The system usually consists of the following components: a reaction chamber: a sealed container containing an etching area, used to place material samples to be etched. The environmental control in the reaction chamber can ensure the stability and consistency of the etching process. Gas supply system: used to provide chemical gas mixtures required for etching, such as fluoride, chloride, etc. The gas supply system also includes gas purification and filtration devices to ensure the supply of high-purity gas. Plasma source: A device that generates plasma, usually using an RF or microwave power source. The plasma source generates high-energy particles for etching the material surface by ionizing the gas. Control system: Used to monitor and control parameters of the etching process, such as gas flow rate, pressure, power, etc. The control system can adjust parameters according to specific etching requirements to achieve the desired etching effect. Chemical gas efficient etching systems play an important role in microelectronic manufacturing, which can be used to manufacture semiconductor devices, integrated circuits, optical devices, sensors, and micro/nanostructures. Its high-precision and high-efficiency etching ability makes the preparation of fine structures more precise and controllable, meeting the demand for microelectronic devices in today's high-tech field.
Global Chemical Gas Efficient Etching System market is projected to reach US$ million in 2029, increasing from US$ million in 2022, with the CAGR of % during the period of 2023 to 2029. Influencing issues, such as economy environments, COVID-19 and Russia-Ukraine War, have led to great market fluctuations in the past few years and are considered comprehensively in the whole Chemical Gas Efficient Etching System market research.
Key manufacturers engaged in the Chemical Gas Efficient Etching System industry include Applied Materials, Inc., Lam Research Corporation, Tokyo Electron Limited, ASML Holding N.V., KLA Corporation, Hitachi High-Technologies Corporation, SCREEN Holdings Co., Ltd., Nikon Corporation and ASM International N.V., etc. Among those manufacturers, the top 3 players guaranteed % supply worldwide in 2022.
For production bases, global Chemical Gas Efficient Etching System production is dominated by and . The two regions contributed to % production share globally in 2022.
When refers to consumption region, % volume of Chemical Gas Efficient Etching System were sold to North America, Europe and Asia Pacific in 2022. Moreover, China, plays a key role in the whole Chemical Gas Efficient Etching System market and estimated to attract more attentions from industry insiders and investors.
Report Scope
This report, based on historical analysis (2018-2022) and forecast calculation (2023-2029), aims to help readers to get a comprehensive understanding of global Chemical Gas Efficient Etching System market with multiple angles, which provides sufficient supports to readers’ strategy and decision making.
By Company
Applied Materials, Inc.
Lam Research Corporation
Tokyo Electron Limited
ASML Holding N.V.
KLA Corporation
Hitachi High-Technologies Corporation
SCREEN Holdings Co., Ltd.
Nikon Corporation
ASM International N.V.
Veeco Instruments Inc.
SPTS Technologies Ltd.
Mattson Technology, Inc.
TEL NEXX, Inc.
Axcelis Technologies, Inc.
Segment by Type
Dry Etching System
Wet Etching System
Segment by Application
Semiconductor Industry
Optoelectronics Industry
Mems Industry
Others
Production by Region
North America
Europe
China
Japan
Consumption by Region
North America
United States
Canada
Europe
Germany
France
U.K.
Italy
Russia
Asia-Pacific
China
Japan
South Korea
China Taiwan
Southeast Asia
India
Latin America, Middle East & Africa
Mexico
Brazil
Turkey
GCC Countries
The Chemical Gas Efficient Etching System report covers below items:
Chapter 1: Product Basic Information (Definition, type and application)
Chapter 2: Manufacturers’ Competition Patterns
Chapter 3: Production Region Distribution and Analysis
Chapter 4: Country Level Sales Analysis
Chapter 5: Product Type Analysis
Chapter 6: Product Application Analysis
Chapter 7: Manufacturers’ Outline
Chapter 8: Industry Chain, Market Channel and Customer Analysis
Chapter 9: Market Opportunities and Challenges
Chapter 10: Market Conclusions
Chapter 11: Research Methodology and Data Source
Index1 Chemical Gas Efficient Etching System Market Overview
1.1 Product Definition
1.2 Chemical Gas Efficient Etching System Segment by Type
1.2.1 Global Chemical Gas Efficient Etching System Market Value Growth Rate Analysis by Type 2022 VS 2029
1.2.2 Dry Etching System
1.2.3 Wet Etching System
1.3 Chemical Gas Efficient Etching System Segment by Application
1.3.1 Global Chemical Gas Efficient Etching System Market Value Growth Rate Analysis by Application: 2022 VS 2029
1.3.2 Semiconductor Industry
1.3.3 Optoelectronics Industry
1.3.4 Mems Industry
1.3.5 Others
1.4 Global Market Growth Prospects
1.4.1 Global Chemical Gas Efficient Etching System Production Value Estimates and Forecasts (2018-2029)
1.4.2 Global Chemical Gas Efficient Etching System Production Capacity Estimates and Forecasts (2018-2029)
1.4.3 Global Chemical Gas Efficient Etching System Production Estimates and Forecasts (2018-2029)
1.4.4 Global Chemical Gas Efficient Etching System Market Average Price Estimates and Forecasts (2018-2029)
1.5 Assumptions and Limitations
2 Market Competition by Manufacturers
2.1 Global Chemical Gas Efficient Etching System Production Market Share by Manufacturers (2018-2023)
2.2 Global Chemical Gas Efficient Etching System Production Value Market Share by Manufacturers (2018-2023)
2.3 Global Key Players of Chemical Gas Efficient Etching System, Industry Ranking, 2021 VS 2022 VS 2023
2.4 Global Chemical Gas Efficient Etching System Market Share by Company Type (Tier 1, Tier 2 and Tier 3)
2.5 Global Chemical Gas Efficient Etching System Average Price by Manufacturers (2018-2023)
2.6 Global Key Manufacturers of Chemical Gas Efficient Etching System, Manufacturing Base Distribution and Headquarters
2.7 Global Key Manufacturers of Chemical Gas Efficient Etching System, Product Offered and Application
2.8 Global Key Manufacturers of Chemical Gas Efficient Etching System, Date of Enter into This Industry
2.9 Chemical Gas Efficient Etching System Market Competitive Situation and Trends
2.9.1 Chemical Gas Efficient Etching System Market Concentration Rate
2.9.2 Global 5 and 10 Largest Chemical Gas Efficient Etching System Players Market Share by Revenue
2.10 Mergers & Acquisitions, Expansion
3 Chemical Gas Efficient Etching System Production by Region
3.1 Global Chemical Gas Efficient Etching System Production Value Estimates and Forecasts by Region: 2018 VS 2022 VS 2029
3.2 Global Chemical Gas Efficient Etching System Production Value by Region (2018-2029)
3.2.1 Global Chemical Gas Efficient Etching System Production Value Market Share by Region (2018-2023)
3.2.2 Global Forecasted Production Value of Chemical Gas Efficient Etching System by Region (2024-2029)
3.3 Global Chemical Gas Efficient Etching System Production Estimates and Forecasts by Region: 2018 VS 2022 VS 2029
3.4 Global Chemical Gas Efficient Etching System Production by Region (2018-2029)
3.4.1 Global Chemical Gas Efficient Etching System Production Market Share by Region (2018-2023)
3.4.2 Global Forecasted Production of Chemical Gas Efficient Etching System by Region (2024-2029)
3.5 Global Chemical Gas Efficient Etching System Market Price Analysis by Region (2018-2023)
3.6 Global Chemical Gas Efficient Etching System Production and Value, Year-over-Year Growth
3.6.1 North America Chemical Gas Efficient Etching System Production Value Estimates and Forecasts (2018-2029)
3.6.2 Europe Chemical Gas Efficient Etching System Production Value Estimates and Forecasts (2018-2029)
3.6.3 China Chemical Gas Efficient Etching System Production Value Estimates and Forecasts (2018-2029)
3.6.4 Japan Chemical Gas Efficient Etching System Production Value Estimates and Forecasts (2018-2029)
4 Chemical Gas Efficient Etching System Consumption by Region
4.1 Global Chemical Gas Efficient Etching System Consumption Estimates and Forecasts by Region: 2018 VS 2022 VS 2029
4.2 Global Chemical Gas Efficient Etching System Consumption by Region (2018-2029)
4.2.1 Global Chemical Gas Efficient Etching System Consumption by Region (2018-2023)
4.2.2 Global Chemical Gas Efficient Etching System Forecasted Consumption by Region (2024-2029)
4.3 North America
4.3.1 North America Chemical Gas Efficient Etching System Consumption Growth Rate by Country: 2018 VS 2022 VS 2029
4.3.2 North America Chemical Gas Efficient Etching System Consumption by Country (2018-2029)
4.3.3 United States
4.3.4 Canada
4.4 Europe
4.4.1 Europe Chemical Gas Efficient Etching System Consumption Growth Rate by Country: 2018 VS 2022 VS 2029
4.4.2 Europe Chemical Gas Efficient Etching System Consumption by Country (2018-2029)
4.4.3 Germany
4.4.4 France
4.4.5 U.K.
4.4.6 Italy
4.4.7 Russia
4.5 Asia Pacific
4.5.1 Asia Pacific Chemical Gas Efficient Etching System Consumption Growth Rate by Region: 2018 VS 2022 VS 2029
4.5.2 Asia Pacific Chemical Gas Efficient Etching System Consumption by Region (2018-2029)
4.5.3 China
4.5.4 Japan
4.5.5 South Korea
4.5.6 China Taiwan
4.5.7 Southeast Asia
4.5.8 India
4.6 Latin America, Middle East & Africa
4.6.1 Latin America, Middle East & Africa Chemical Gas Efficient Etching System Consumption Growth Rate by Country: 2018 VS 2022 VS 2029
4.6.2 Latin America, Middle East & Africa Chemical Gas Efficient Etching System Consumption by Country (2018-2029)
4.6.3 Mexico
4.6.4 Brazil
4.6.5 Turkey
4.6.6 GCC Countries
5 Segment by Type
5.1 Global Chemical Gas Efficient Etching System Production by Type (2018-2029)
5.1.1 Global Chemical Gas Efficient Etching System Production by Type (2018-2023)
5.1.2 Global Chemical Gas Efficient Etching System Production by Type (2024-2029)
5.1.3 Global Chemical Gas Efficient Etching System Production Market Share by Type (2018-2029)
5.2 Global Chemical Gas Efficient Etching System Production Value by Type (2018-2029)
5.2.1 Global Chemical Gas Efficient Etching System Production Value by Type (2018-2023)
5.2.2 Global Chemical Gas Efficient Etching System Production Value by Type (2024-2029)
5.2.3 Global Chemical Gas Efficient Etching System Production Value Market Share by Type (2018-2029)
5.3 Global Chemical Gas Efficient Etching System Price by Type (2018-2029)
6 Segment by Application
6.1 Global Chemical Gas Efficient Etching System Production by Application (2018-2029)
6.1.1 Global Chemical Gas Efficient Etching System Production by Application (2018-2023)
6.1.2 Global Chemical Gas Efficient Etching System Production by Application (2024-2029)
6.1.3 Global Chemical Gas Efficient Etching System Production Market Share by Application (2018-2029)
6.2 Global Chemical Gas Efficient Etching System Production Value by Application (2018-2029)
6.2.1 Global Chemical Gas Efficient Etching System Production Value by Application (2018-2023)
6.2.2 Global Chemical Gas Efficient Etching System Production Value by Application (2024-2029)
6.2.3 Global Chemical Gas Efficient Etching System Production Value Market Share by Application (2018-2029)
6.3 Global Chemical Gas Efficient Etching System Price by Application (2018-2029)
7 Key Companies Profiled
7.1 Applied Materials, Inc.
7.1.1 Applied Materials, Inc. Chemical Gas Efficient Etching System Corporation Information
7.1.2 Applied Materials, Inc. Chemical Gas Efficient Etching System Product Portfolio
7.1.3 Applied Materials, Inc. Chemical Gas Efficient Etching System Production, Value, Price and Gross Margin (2018-2023)
7.1.4 Applied Materials, Inc. Main Business and Markets Served
7.1.5 Applied Materials, Inc. Recent Developments/Updates
7.2 Lam Research Corporation
7.2.1 Lam Research Corporation Chemical Gas Efficient Etching System Corporation Information
7.2.2 Lam Research Corporation Chemical Gas Efficient Etching System Product Portfolio
7.2.3 Lam Research Corporation Chemical Gas Efficient Etching System Production, Value, Price and Gross Margin (2018-2023)
7.2.4 Lam Research Corporation Main Business and Markets Served
7.2.5 Lam Research Corporation Recent Developments/Updates
7.3 Tokyo Electron Limited
7.3.1 Tokyo Electron Limited Chemical Gas Efficient Etching System Corporation Information
7.3.2 Tokyo Electron Limited Chemical Gas Efficient Etching System Product Portfolio
7.3.3 Tokyo Electron Limited Chemical Gas Efficient Etching System Production, Value, Price and Gross Margin (2018-2023)
7.3.4 Tokyo Electron Limited Main Business and Markets Served
7.3.5 Tokyo Electron Limited Recent Developments/Updates
7.4 ASML Holding N.V.
7.4.1 ASML Holding N.V. Chemical Gas Efficient Etching System Corporation Information
7.4.2 ASML Holding N.V. Chemical Gas Efficient Etching System Product Portfolio
7.4.3 ASML Holding N.V. Chemical Gas Efficient Etching System Production, Value, Price and Gross Margin (2018-2023)
7.4.4 ASML Holding N.V. Main Business and Markets Served
7.4.5 ASML Holding N.V. Recent Developments/Updates
7.5 KLA Corporation
7.5.1 KLA Corporation Chemical Gas Efficient Etching System Corporation Information
7.5.2 KLA Corporation Chemical Gas Efficient Etching System Product Portfolio
7.5.3 KLA Corporation Chemical Gas Efficient Etching System Production, Value, Price and Gross Margin (2018-2023)
7.5.4 KLA Corporation Main Business and Markets Served
7.5.5 KLA Corporation Recent Developments/Updates
7.6 Hitachi High-Technologies Corporation
7.6.1 Hitachi High-Technologies Corporation Chemical Gas Efficient Etching System Corporation Information
7.6.2 Hitachi High-Technologies Corporation Chemical Gas Efficient Etching System Product Portfolio
7.6.3 Hitachi High-Technologies Corporation Chemical Gas Efficient Etching System Production, Value, Price and Gross Margin (2018-2023)
7.6.4 Hitachi High-Technologies Corporation Main Business and Markets Served
7.6.5 Hitachi High-Technologies Corporation Recent Developments/Updates
7.7 SCREEN Holdings Co., Ltd.
7.7.1 SCREEN Holdings Co., Ltd. Chemical Gas Efficient Etching System Corporation Information
7.7.2 SCREEN Holdings Co., Ltd. Chemical Gas Efficient Etching System Product Portfolio
7.7.3 SCREEN Holdings Co., Ltd. Chemical Gas Efficient Etching System Production, Value, Price and Gross Margin (2018-2023)
7.7.4 SCREEN Holdings Co., Ltd. Main Business and Markets Served
7.7.5 SCREEN Holdings Co., Ltd. Recent Developments/Updates
7.8 Nikon Corporation
7.8.1 Nikon Corporation Chemical Gas Efficient Etching System Corporation Information
7.8.2 Nikon Corporation Chemical Gas Efficient Etching System Product Portfolio
7.8.3 Nikon Corporation Chemical Gas Efficient Etching System Production, Value, Price and Gross Margin (2018-2023)
7.8.4 Nikon Corporation Main Business and Markets Served
7.7.5 Nikon Corporation Recent Developments/Updates
7.9 ASM International N.V.
7.9.1 ASM International N.V. Chemical Gas Efficient Etching System Corporation Information
7.9.2 ASM International N.V. Chemical Gas Efficient Etching System Product Portfolio
7.9.3 ASM International N.V. Chemical Gas Efficient Etching System Production, Value, Price and Gross Margin (2018-2023)
7.9.4 ASM International N.V. Main Business and Markets Served
7.9.5 ASM International N.V. Recent Developments/Updates
7.10 Veeco Instruments Inc.
7.10.1 Veeco Instruments Inc. Chemical Gas Efficient Etching System Corporation Information
7.10.2 Veeco Instruments Inc. Chemical Gas Efficient Etching System Product Portfolio
7.10.3 Veeco Instruments Inc. Chemical Gas Efficient Etching System Production, Value, Price and Gross Margin (2018-2023)
7.10.4 Veeco Instruments Inc. Main Business and Markets Served
7.10.5 Veeco Instruments Inc. Recent Developments/Updates
7.11 SPTS Technologies Ltd.
7.11.1 SPTS Technologies Ltd. Chemical Gas Efficient Etching System Corporation Information
7.11.2 SPTS Technologies Ltd. Chemical Gas Efficient Etching System Product Portfolio
7.11.3 SPTS Technologies Ltd. Chemical Gas Efficient Etching System Production, Value, Price and Gross Margin (2018-2023)
7.11.4 SPTS Technologies Ltd. Main Business and Markets Served
7.11.5 SPTS Technologies Ltd. Recent Developments/Updates
7.12 Mattson Technology, Inc.
7.12.1 Mattson Technology, Inc. Chemical Gas Efficient Etching System Corporation Information
7.12.2 Mattson Technology, Inc. Chemical Gas Efficient Etching System Product Portfolio
7.12.3 Mattson Technology, Inc. Chemical Gas Efficient Etching System Production, Value, Price and Gross Margin (2018-2023)
7.12.4 Mattson Technology, Inc. Main Business and Markets Served
7.12.5 Mattson Technology, Inc. Recent Developments/Updates
7.13 TEL NEXX, Inc.
7.13.1 TEL NEXX, Inc. Chemical Gas Efficient Etching System Corporation Information
7.13.2 TEL NEXX, Inc. Chemical Gas Efficient Etching System Product Portfolio
7.13.3 TEL NEXX, Inc. Chemical Gas Efficient Etching System Production, Value, Price and Gross Margin (2018-2023)
7.13.4 TEL NEXX, Inc. Main Business and Markets Served
7.13.5 TEL NEXX, Inc. Recent Developments/Updates
7.14 Axcelis Technologies, Inc.
7.14.1 Axcelis Technologies, Inc. Chemical Gas Efficient Etching System Corporation Information
7.14.2 Axcelis Technologies, Inc. Chemical Gas Efficient Etching System Product Portfolio
7.14.3 Axcelis Technologies, Inc. Chemical Gas Efficient Etching System Production, Value, Price and Gross Margin (2018-2023)
7.14.4 Axcelis Technologies, Inc. Main Business and Markets Served
7.14.5 Axcelis Technologies, Inc. Recent Developments/Updates
8 Industry Chain and Sales Channels Analysis
8.1 Chemical Gas Efficient Etching System Industry Chain Analysis
8.2 Chemical Gas Efficient Etching System Key Raw Materials
8.2.1 Key Raw Materials
8.2.2 Raw Materials Key Suppliers
8.3 Chemical Gas Efficient Etching System Production Mode & Process
8.4 Chemical Gas Efficient Etching System Sales and Marketing
8.4.1 Chemical Gas Efficient Etching System Sales Channels
8.4.2 Chemical Gas Efficient Etching System Distributors
8.5 Chemical Gas Efficient Etching System Customers
9 Chemical Gas Efficient Etching System Market Dynamics
9.1 Chemical Gas Efficient Etching System Industry Trends
9.2 Chemical Gas Efficient Etching System Market Drivers
9.3 Chemical Gas Efficient Etching System Market Challenges
9.4 Chemical Gas Efficient Etching System Market Restraints
10 Research Finding and Conclusion
11 Methodology and Data Source
11.1 Methodology/Research Approach
11.1.1 Research Programs/Design
11.1.2 Market Size Estimation
11.1.3 Market Breakdown and Data Triangulation
11.2 Data Source
11.2.1 Secondary Sources
11.2.2 Primary Sources
11.3 Author List
11.4 Disclaimer
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