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Global Wafer Dry Cleaning Equipment Market Research Report 2025
Synopsis
Dry cleaning equipment is used to clean semiconductor wafers without the use of liquids or solvents. This type of cleaning is often preferred over wet cleaning because it eliminates the risk of residue and reduces the risk of particle contamination. Dry cleaning equipment can come in different forms such as plasma cleaning equipment, vapor phase cleaning equipment, and physical cleaning equipment such as mechanical and thermal cleaning systems.
Plasma cleaning, vapor phase cleaning, and physical cleaning are all methods used to remove contaminants from surfaces in the semiconductor industry. Each method has its own advantages and disadvantages and the best method to use depends on the specific cleaning requirements.
Plasma cleaning uses a plasma discharge to remove contaminants from a surface. This method is effective for removing organic and inorganic materials, but it can also cause damage to the surface if not controlled properly.
Vapor phase cleaning uses solvents that are heated to a temperature at which they vaporize. The vapor then reacts with the contaminants on the surface to dissolve or remove them. This method is effective for removing organic contaminants, but it can also be expensive and time-consuming.
Physical cleaning involves using physical means such as brushing or blasting to remove contaminants from the surface. This method is effective for removing particles and debris, but it may not be as effective for removing more stubborn contaminants.
In summary, plasma cleaning is effective for removing a wide range of contaminants, vapor phase cleaning is best for removing organic materials, and physical cleaning is best for removing particles and debris.
Global Wafer Dry Cleaning Equipment market is projected to reach US$ million in 2029, increasing from US$ million in 2022, with the CAGR of % during the period of 2023 to 2029. Influencing issues, such as economy environments, COVID-19 and Russia-Ukraine War, have led to great market fluctuations in the past few years and are considered comprehensively in the whole Wafer Dry Cleaning Equipment market research.
Key manufacturers engaged in the Wafer Dry Cleaning Equipment industry include Applied Materials, Bruker Corporation, IMT Co., Ltd., Lam Research, Tokyo Electron Limited, PSK Inc, Plasma-Therm, Novellus Systems and Oxford Instruments, etc. Among those manufacturers, the top 3 players guaranteed % supply worldwide in 2022.
For production bases, global Wafer Dry Cleaning Equipment production is dominated by and . The two regions contributed to % production share globally in 2022.
When refers to consumption region, % volume of Wafer Dry Cleaning Equipment were sold to North America, Europe and Asia Pacific in 2022. Moreover, China, plays a key role in the whole Wafer Dry Cleaning Equipment market and estimated to attract more attentions from industry insiders and investors.
Report Scope
This report, based on historical analysis (2018-2022) and forecast calculation (2023-2029), aims to help readers to get a comprehensive understanding of global Wafer Dry Cleaning Equipment market with multiple angles, which provides sufficient supports to readers’ strategy and decision making.
By Company
Applied Materials
Bruker Corporation
IMT Co., Ltd.
Lam Research
Tokyo Electron Limited
PSK Inc
Plasma-Therm
Novellus Systems
Oxford Instruments
KLA Corporation
TEL NEXX Inc
Rudolph Technologies
Segment by Type
Plasma Cleaning Equipment
Vapor Phase Cleaning Equipment
Physical Cleaning Equipment
Segment by Application
Semiconductor
Photovoltaic Industry
MEMS (Micro-Electro-Mechanical Systems)
Optoelectronics Industry
Nanotechnology
Others
Production by Region
North America
Europe
China
Japan
Consumption by Region
North America
United States
Canada
Europe
Germany
France
U.K.
Italy
Russia
Asia-Pacific
China
Japan
South Korea
China Taiwan
Southeast Asia
India
Latin America, Middle East & Africa
Mexico
Brazil
Turkey
GCC Countries
The Wafer Dry Cleaning Equipment report covers below items:
Chapter 1: Product Basic Information (Definition, type and application)
Chapter 2: Manufacturers’ Competition Patterns
Chapter 3: Production Region Distribution and Analysis
Chapter 4: Country Level Sales Analysis
Chapter 5: Product Type Analysis
Chapter 6: Product Application Analysis
Chapter 7: Manufacturers’ Outline
Chapter 8: Industry Chain, Market Channel and Customer Analysis
Chapter 9: Market Opportunities and Challenges
Chapter 10: Market Conclusions
Chapter 11: Research Methodology and Data Source
Dry cleaning equipment is used to clean semiconductor wafers without the use of liquids or solvents. This type of cleaning is often preferred over wet cleaning because it eliminates the risk of residue and reduces the risk of particle contamination. Dry cleaning equipment can come in different forms such as plasma cleaning equipment, vapor phase cleaning equipment, and physical cleaning equipment such as mechanical and thermal cleaning systems.
Plasma cleaning, vapor phase cleaning, and physical cleaning are all methods used to remove contaminants from surfaces in the semiconductor industry. Each method has its own advantages and disadvantages and the best method to use depends on the specific cleaning requirements.
Plasma cleaning uses a plasma discharge to remove contaminants from a surface. This method is effective for removing organic and inorganic materials, but it can also cause damage to the surface if not controlled properly.
Vapor phase cleaning uses solvents that are heated to a temperature at which they vaporize. The vapor then reacts with the contaminants on the surface to dissolve or remove them. This method is effective for removing organic contaminants, but it can also be expensive and time-consuming.
Physical cleaning involves using physical means such as brushing or blasting to remove contaminants from the surface. This method is effective for removing particles and debris, but it may not be as effective for removing more stubborn contaminants.
In summary, plasma cleaning is effective for removing a wide range of contaminants, vapor phase cleaning is best for removing organic materials, and physical cleaning is best for removing particles and debris.
Global Wafer Dry Cleaning Equipment market is projected to reach US$ million in 2029, increasing from US$ million in 2022, with the CAGR of % during the period of 2023 to 2029. Influencing issues, such as economy environments, COVID-19 and Russia-Ukraine War, have led to great market fluctuations in the past few years and are considered comprehensively in the whole Wafer Dry Cleaning Equipment market research.
Key manufacturers engaged in the Wafer Dry Cleaning Equipment industry include Applied Materials, Bruker Corporation, IMT Co., Ltd., Lam Research, Tokyo Electron Limited, PSK Inc, Plasma-Therm, Novellus Systems and Oxford Instruments, etc. Among those manufacturers, the top 3 players guaranteed % supply worldwide in 2022.
For production bases, global Wafer Dry Cleaning Equipment production is dominated by and . The two regions contributed to % production share globally in 2022.
When refers to consumption region, % volume of Wafer Dry Cleaning Equipment were sold to North America, Europe and Asia Pacific in 2022. Moreover, China, plays a key role in the whole Wafer Dry Cleaning Equipment market and estimated to attract more attentions from industry insiders and investors.
Report Scope
This report, based on historical analysis (2018-2022) and forecast calculation (2023-2029), aims to help readers to get a comprehensive understanding of global Wafer Dry Cleaning Equipment market with multiple angles, which provides sufficient supports to readers’ strategy and decision making.
By Company
Applied Materials
Bruker Corporation
IMT Co., Ltd.
Lam Research
Tokyo Electron Limited
PSK Inc
Plasma-Therm
Novellus Systems
Oxford Instruments
KLA Corporation
TEL NEXX Inc
Rudolph Technologies
Segment by Type
Plasma Cleaning Equipment
Vapor Phase Cleaning Equipment
Physical Cleaning Equipment
Segment by Application
Semiconductor
Photovoltaic Industry
MEMS (Micro-Electro-Mechanical Systems)
Optoelectronics Industry
Nanotechnology
Others
Production by Region
North America
Europe
China
Japan
Consumption by Region
North America
United States
Canada
Europe
Germany
France
U.K.
Italy
Russia
Asia-Pacific
China
Japan
South Korea
China Taiwan
Southeast Asia
India
Latin America, Middle East & Africa
Mexico
Brazil
Turkey
GCC Countries
The Wafer Dry Cleaning Equipment report covers below items:
Chapter 1: Product Basic Information (Definition, type and application)
Chapter 2: Manufacturers’ Competition Patterns
Chapter 3: Production Region Distribution and Analysis
Chapter 4: Country Level Sales Analysis
Chapter 5: Product Type Analysis
Chapter 6: Product Application Analysis
Chapter 7: Manufacturers’ Outline
Chapter 8: Industry Chain, Market Channel and Customer Analysis
Chapter 9: Market Opportunities and Challenges
Chapter 10: Market Conclusions
Chapter 11: Research Methodology and Data Source
Index1 Wafer Dry Cleaning Equipment Market Overview
1.1 Product Definition
1.2 Wafer Dry Cleaning Equipment Segment by Type
1.2.1 Global Wafer Dry Cleaning Equipment Market Value Growth Rate Analysis by Type 2022 VS 2029
1.2.2 Plasma Cleaning Equipment
1.2.3 Vapor Phase Cleaning Equipment
1.2.4 Physical Cleaning Equipment
1.3 Wafer Dry Cleaning Equipment Segment by Application
1.3.1 Global Wafer Dry Cleaning Equipment Market Value Growth Rate Analysis by Application: 2022 VS 2029
1.3.2 Semiconductor
1.3.3 Photovoltaic Industry
1.3.4 MEMS (Micro-Electro-Mechanical Systems)
1.3.5 Optoelectronics Industry
1.3.6 Nanotechnology
1.3.7 Others
1.4 Global Market Growth Prospects
1.4.1 Global Wafer Dry Cleaning Equipment Production Value Estimates and Forecasts (2018-2029)
1.4.2 Global Wafer Dry Cleaning Equipment Production Capacity Estimates and Forecasts (2018-2029)
1.4.3 Global Wafer Dry Cleaning Equipment Production Estimates and Forecasts (2018-2029)
1.4.4 Global Wafer Dry Cleaning Equipment Market Average Price Estimates and Forecasts (2018-2029)
1.5 Assumptions and Limitations
2 Market Competition by Manufacturers
2.1 Global Wafer Dry Cleaning Equipment Production Market Share by Manufacturers (2018-2023)
2.2 Global Wafer Dry Cleaning Equipment Production Value Market Share by Manufacturers (2018-2023)
2.3 Global Key Players of Wafer Dry Cleaning Equipment, Industry Ranking, 2021 VS 2022 VS 2023
2.4 Global Wafer Dry Cleaning Equipment Market Share by Company Type (Tier 1, Tier 2 and Tier 3)
2.5 Global Wafer Dry Cleaning Equipment Average Price by Manufacturers (2018-2023)
2.6 Global Key Manufacturers of Wafer Dry Cleaning Equipment, Manufacturing Base Distribution and Headquarters
2.7 Global Key Manufacturers of Wafer Dry Cleaning Equipment, Product Offered and Application
2.8 Global Key Manufacturers of Wafer Dry Cleaning Equipment, Date of Enter into This Industry
2.9 Wafer Dry Cleaning Equipment Market Competitive Situation and Trends
2.9.1 Wafer Dry Cleaning Equipment Market Concentration Rate
2.9.2 Global 5 and 10 Largest Wafer Dry Cleaning Equipment Players Market Share by Revenue
2.10 Mergers & Acquisitions, Expansion
3 Wafer Dry Cleaning Equipment Production by Region
3.1 Global Wafer Dry Cleaning Equipment Production Value Estimates and Forecasts by Region: 2018 VS 2022 VS 2029
3.2 Global Wafer Dry Cleaning Equipment Production Value by Region (2018-2029)
3.2.1 Global Wafer Dry Cleaning Equipment Production Value Market Share by Region (2018-2023)
3.2.2 Global Forecasted Production Value of Wafer Dry Cleaning Equipment by Region (2024-2029)
3.3 Global Wafer Dry Cleaning Equipment Production Estimates and Forecasts by Region: 2018 VS 2022 VS 2029
3.4 Global Wafer Dry Cleaning Equipment Production by Region (2018-2029)
3.4.1 Global Wafer Dry Cleaning Equipment Production Market Share by Region (2018-2023)
3.4.2 Global Forecasted Production of Wafer Dry Cleaning Equipment by Region (2024-2029)
3.5 Global Wafer Dry Cleaning Equipment Market Price Analysis by Region (2018-2023)
3.6 Global Wafer Dry Cleaning Equipment Production and Value, Year-over-Year Growth
3.6.1 North America Wafer Dry Cleaning Equipment Production Value Estimates and Forecasts (2018-2029)
3.6.2 Europe Wafer Dry Cleaning Equipment Production Value Estimates and Forecasts (2018-2029)
3.6.3 China Wafer Dry Cleaning Equipment Production Value Estimates and Forecasts (2018-2029)
3.6.4 Japan Wafer Dry Cleaning Equipment Production Value Estimates and Forecasts (2018-2029)
4 Wafer Dry Cleaning Equipment Consumption by Region
4.1 Global Wafer Dry Cleaning Equipment Consumption Estimates and Forecasts by Region: 2018 VS 2022 VS 2029
4.2 Global Wafer Dry Cleaning Equipment Consumption by Region (2018-2029)
4.2.1 Global Wafer Dry Cleaning Equipment Consumption by Region (2018-2023)
4.2.2 Global Wafer Dry Cleaning Equipment Forecasted Consumption by Region (2024-2029)
4.3 North America
4.3.1 North America Wafer Dry Cleaning Equipment Consumption Growth Rate by Country: 2018 VS 2022 VS 2029
4.3.2 North America Wafer Dry Cleaning Equipment Consumption by Country (2018-2029)
4.3.3 United States
4.3.4 Canada
4.4 Europe
4.4.1 Europe Wafer Dry Cleaning Equipment Consumption Growth Rate by Country: 2018 VS 2022 VS 2029
4.4.2 Europe Wafer Dry Cleaning Equipment Consumption by Country (2018-2029)
4.4.3 Germany
4.4.4 France
4.4.5 U.K.
4.4.6 Italy
4.4.7 Russia
4.5 Asia Pacific
4.5.1 Asia Pacific Wafer Dry Cleaning Equipment Consumption Growth Rate by Region: 2018 VS 2022 VS 2029
4.5.2 Asia Pacific Wafer Dry Cleaning Equipment Consumption by Region (2018-2029)
4.5.3 China
4.5.4 Japan
4.5.5 South Korea
4.5.6 China Taiwan
4.5.7 Southeast Asia
4.5.8 India
4.6 Latin America, Middle East & Africa
4.6.1 Latin America, Middle East & Africa Wafer Dry Cleaning Equipment Consumption Growth Rate by Country: 2018 VS 2022 VS 2029
4.6.2 Latin America, Middle East & Africa Wafer Dry Cleaning Equipment Consumption by Country (2018-2029)
4.6.3 Mexico
4.6.4 Brazil
4.6.5 Turkey
4.6.6 GCC Countries
5 Segment by Type
5.1 Global Wafer Dry Cleaning Equipment Production by Type (2018-2029)
5.1.1 Global Wafer Dry Cleaning Equipment Production by Type (2018-2023)
5.1.2 Global Wafer Dry Cleaning Equipment Production by Type (2024-2029)
5.1.3 Global Wafer Dry Cleaning Equipment Production Market Share by Type (2018-2029)
5.2 Global Wafer Dry Cleaning Equipment Production Value by Type (2018-2029)
5.2.1 Global Wafer Dry Cleaning Equipment Production Value by Type (2018-2023)
5.2.2 Global Wafer Dry Cleaning Equipment Production Value by Type (2024-2029)
5.2.3 Global Wafer Dry Cleaning Equipment Production Value Market Share by Type (2018-2029)
5.3 Global Wafer Dry Cleaning Equipment Price by Type (2018-2029)
6 Segment by Application
6.1 Global Wafer Dry Cleaning Equipment Production by Application (2018-2029)
6.1.1 Global Wafer Dry Cleaning Equipment Production by Application (2018-2023)
6.1.2 Global Wafer Dry Cleaning Equipment Production by Application (2024-2029)
6.1.3 Global Wafer Dry Cleaning Equipment Production Market Share by Application (2018-2029)
6.2 Global Wafer Dry Cleaning Equipment Production Value by Application (2018-2029)
6.2.1 Global Wafer Dry Cleaning Equipment Production Value by Application (2018-2023)
6.2.2 Global Wafer Dry Cleaning Equipment Production Value by Application (2024-2029)
6.2.3 Global Wafer Dry Cleaning Equipment Production Value Market Share by Application (2018-2029)
6.3 Global Wafer Dry Cleaning Equipment Price by Application (2018-2029)
7 Key Companies Profiled
7.1 Applied Materials
7.1.1 Applied Materials Wafer Dry Cleaning Equipment Corporation Information
7.1.2 Applied Materials Wafer Dry Cleaning Equipment Product Portfolio
7.1.3 Applied Materials Wafer Dry Cleaning Equipment Production, Value, Price and Gross Margin (2018-2023)
7.1.4 Applied Materials Main Business and Markets Served
7.1.5 Applied Materials Recent Developments/Updates
7.2 Bruker Corporation
7.2.1 Bruker Corporation Wafer Dry Cleaning Equipment Corporation Information
7.2.2 Bruker Corporation Wafer Dry Cleaning Equipment Product Portfolio
7.2.3 Bruker Corporation Wafer Dry Cleaning Equipment Production, Value, Price and Gross Margin (2018-2023)
7.2.4 Bruker Corporation Main Business and Markets Served
7.2.5 Bruker Corporation Recent Developments/Updates
7.3 IMT Co., Ltd.
7.3.1 IMT Co., Ltd. Wafer Dry Cleaning Equipment Corporation Information
7.3.2 IMT Co., Ltd. Wafer Dry Cleaning Equipment Product Portfolio
7.3.3 IMT Co., Ltd. Wafer Dry Cleaning Equipment Production, Value, Price and Gross Margin (2018-2023)
7.3.4 IMT Co., Ltd. Main Business and Markets Served
7.3.5 IMT Co., Ltd. Recent Developments/Updates
7.4 Lam Research
7.4.1 Lam Research Wafer Dry Cleaning Equipment Corporation Information
7.4.2 Lam Research Wafer Dry Cleaning Equipment Product Portfolio
7.4.3 Lam Research Wafer Dry Cleaning Equipment Production, Value, Price and Gross Margin (2018-2023)
7.4.4 Lam Research Main Business and Markets Served
7.4.5 Lam Research Recent Developments/Updates
7.5 Tokyo Electron Limited
7.5.1 Tokyo Electron Limited Wafer Dry Cleaning Equipment Corporation Information
7.5.2 Tokyo Electron Limited Wafer Dry Cleaning Equipment Product Portfolio
7.5.3 Tokyo Electron Limited Wafer Dry Cleaning Equipment Production, Value, Price and Gross Margin (2018-2023)
7.5.4 Tokyo Electron Limited Main Business and Markets Served
7.5.5 Tokyo Electron Limited Recent Developments/Updates
7.6 PSK Inc
7.6.1 PSK Inc Wafer Dry Cleaning Equipment Corporation Information
7.6.2 PSK Inc Wafer Dry Cleaning Equipment Product Portfolio
7.6.3 PSK Inc Wafer Dry Cleaning Equipment Production, Value, Price and Gross Margin (2018-2023)
7.6.4 PSK Inc Main Business and Markets Served
7.6.5 PSK Inc Recent Developments/Updates
7.7 Plasma-Therm
7.7.1 Plasma-Therm Wafer Dry Cleaning Equipment Corporation Information
7.7.2 Plasma-Therm Wafer Dry Cleaning Equipment Product Portfolio
7.7.3 Plasma-Therm Wafer Dry Cleaning Equipment Production, Value, Price and Gross Margin (2018-2023)
7.7.4 Plasma-Therm Main Business and Markets Served
7.7.5 Plasma-Therm Recent Developments/Updates
7.8 Novellus Systems
7.8.1 Novellus Systems Wafer Dry Cleaning Equipment Corporation Information
7.8.2 Novellus Systems Wafer Dry Cleaning Equipment Product Portfolio
7.8.3 Novellus Systems Wafer Dry Cleaning Equipment Production, Value, Price and Gross Margin (2018-2023)
7.8.4 Novellus Systems Main Business and Markets Served
7.7.5 Novellus Systems Recent Developments/Updates
7.9 Oxford Instruments
7.9.1 Oxford Instruments Wafer Dry Cleaning Equipment Corporation Information
7.9.2 Oxford Instruments Wafer Dry Cleaning Equipment Product Portfolio
7.9.3 Oxford Instruments Wafer Dry Cleaning Equipment Production, Value, Price and Gross Margin (2018-2023)
7.9.4 Oxford Instruments Main Business and Markets Served
7.9.5 Oxford Instruments Recent Developments/Updates
7.10 KLA Corporation
7.10.1 KLA Corporation Wafer Dry Cleaning Equipment Corporation Information
7.10.2 KLA Corporation Wafer Dry Cleaning Equipment Product Portfolio
7.10.3 KLA Corporation Wafer Dry Cleaning Equipment Production, Value, Price and Gross Margin (2018-2023)
7.10.4 KLA Corporation Main Business and Markets Served
7.10.5 KLA Corporation Recent Developments/Updates
7.11 TEL NEXX Inc
7.11.1 TEL NEXX Inc Wafer Dry Cleaning Equipment Corporation Information
7.11.2 TEL NEXX Inc Wafer Dry Cleaning Equipment Product Portfolio
7.11.3 TEL NEXX Inc Wafer Dry Cleaning Equipment Production, Value, Price and Gross Margin (2018-2023)
7.11.4 TEL NEXX Inc Main Business and Markets Served
7.11.5 TEL NEXX Inc Recent Developments/Updates
7.12 Rudolph Technologies
7.12.1 Rudolph Technologies Wafer Dry Cleaning Equipment Corporation Information
7.12.2 Rudolph Technologies Wafer Dry Cleaning Equipment Product Portfolio
7.12.3 Rudolph Technologies Wafer Dry Cleaning Equipment Production, Value, Price and Gross Margin (2018-2023)
7.12.4 Rudolph Technologies Main Business and Markets Served
7.12.5 Rudolph Technologies Recent Developments/Updates
8 Industry Chain and Sales Channels Analysis
8.1 Wafer Dry Cleaning Equipment Industry Chain Analysis
8.2 Wafer Dry Cleaning Equipment Key Raw Materials
8.2.1 Key Raw Materials
8.2.2 Raw Materials Key Suppliers
8.3 Wafer Dry Cleaning Equipment Production Mode & Process
8.4 Wafer Dry Cleaning Equipment Sales and Marketing
8.4.1 Wafer Dry Cleaning Equipment Sales Channels
8.4.2 Wafer Dry Cleaning Equipment Distributors
8.5 Wafer Dry Cleaning Equipment Customers
9 Wafer Dry Cleaning Equipment Market Dynamics
9.1 Wafer Dry Cleaning Equipment Industry Trends
9.2 Wafer Dry Cleaning Equipment Market Drivers
9.3 Wafer Dry Cleaning Equipment Market Challenges
9.4 Wafer Dry Cleaning Equipment Market Restraints
10 Research Finding and Conclusion
11 Methodology and Data Source
11.1 Methodology/Research Approach
11.1.1 Research Programs/Design
11.1.2 Market Size Estimation
11.1.3 Market Breakdown and Data Triangulation
11.2 Data Source
11.2.1 Secondary Sources
11.2.2 Primary Sources
11.3 Author List
11.4 Disclaimer
Published By : QY Research
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