The Market Reports

Synopsis

The global market for Multi-beam Mask Writer was estimated to be worth US$ 960 million in 2024 and is forecast to a readjusted size of US$ 2084 million by 2031 with a CAGR of 11.9% during the forecast period 2025-2031.

Mask writers are devices that use irradiation by electron beams to draw a fine electronic circuit pattern onto a template (the mask), which has been formed by a silica glass substrate with photosensitive resin. Single-beam mask writers write data to the mask by concentrating the single electron beam on a single position over an electromagnetic field and then deflecting the beam to the position to be irradiated by the polarizer. Large circuit patterns can be created by repeating beam deflection and then moving the stage upon which the substrate is mounted. Using thousands of tiny beamlets, multi-beam mask writers can pattern or write advanced masks at a faster rate compared to VSB-based tools. With chip miniaturization making device designs more complex and requiring the use of more masks, multibeam systems are coming into demand.

Global key players of Multi-beam Mask Writer include IMS Nanofabrication, NuFlare Technology. China is the largest market, and has a share about 46%, followed by North America and South Korea with share 22% and 16%, separately. In terms of product type, 7nm and Above is the largest segment, accounting for a share of 63%. In terms of application, Wafer Manufacturer is the largest field with a share about 86 percent.

This report aims to provide a comprehensive presentation of the global market for Multi-beam Mask Writer, focusing on the total sales volume, sales revenue, price, key companies market share and ranking, together with an analysis of Multi-beam Mask Writer by region & country, by Type, and by Application.

The Multi-beam Mask Writer market size, estimations, and forecasts are provided in terms of sales volume (Units) and sales revenue ($ millions), considering 2024 as the base year, with history and forecast data for the period from 2020 to 2031. With both quantitative and qualitative analysis, to help readers develop business/growth strategies, assess the market competitive situation, analyze their position in the current marketplace, and make informed business decisions regarding Multi-beam Mask Writer.

Market Segmentation

By Company

• IMS Nanofabrication
• NuFlare Technology

Segment by Type

• 7nm and Above
• 5nm
• 3nm and Below

Segment by Application

• Wafer Manufacturer
• EUV Mask Manufacturer

Segment by Region

• North America: United States, Canada, and Mexico
• Europe: United Kingdom, Germany, France, Spain, Italy, and Rest of Europe
• Asia Pacific: China, India, Japan, Australia, South Korea, and Rest of Asia Pacific
• Middle East & Africa: Saudi Arabia, South Africa, and Rest of MEA
• Latin America: Brazil, Argentina, and Rest of Latin America

*If you need a regional or country-specific version, or customized segmentation, we can tailor the report to your requirements.